NANOTHERM FABLINE

an ekrubnano company 

 

 


 

 

 

 

 

150 mm- 200 mm VERTICAL FURNACE PROCESSING 

 

THERMAL PROCESSING TECHNOLOGY

 

Detailed Parameters of the Product

 

 

 

Overview

Vertical furnace with small footprint for high-quality processing.
Nano Therm's vertical furnaces are compact and requires only a small installation area and can process wide range of wafer diameters.

 

 

Applications

  • annealing
  • thermal oxide
  • LPCVD
  • wet oxidation
  • dry oxidation

 

The Nanotherm Fabline  can process 150mm  - 200mm wafers up to 50 at a time.

Carefully selected hardware and control system features enable continuous high temperature wafer processing. The Nanotherm Fabline vertical Furnace's also has the option to be capable of 1300C operation. 

The Nanotherm’s Primary Heating and Controls are manufactured by a proprietary  source that has been producing high temperature furnaces heating systems up to 1300 °C since 1982

 

     

vertical furnac 


 

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Specifications

 

  


 

 

Operational Temperature range

 Up to 1300 c deg 

Supported wafer sizes

75mm to  200mm 

Maximum lot size

12 wafer boat standard (50 wafers optional )

Gases used

N2, Ar & N2 ,(other gasses available upon request)

Applications

Annealing Thermal oxide LPCVD Wet oxidation Dry oxidation

SiC power devices

Element Section Dimensions

Configurable